SAN JOSE — Ultratech Stepper Inc. today rolled out a new exposure tool, called the Star 100, which is aimed at serving lithography process steps with device feature sizes above 0.8 micron. The new ...
Ultratech Stepper Inc. today added a new stepper to its portfolio of advanced-packaging applications. The company said it developed the Saturn Spectrum 300e(2) in response to the growing need for ...
Canon has brought out a back-end process semiconductor lithography i-line stepper system for 3D packaging technologies with a 0.8 µm resolution and an exposure field of 100 mm x 100 mm. The FPA-5520iV ...
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